Semiconductor
Fab process
Target process
- PR Strip process during EUV Photomask manufacturing process
- EUV PhotoMask cleaning
- Wafer cleaning
ArP treatment process
- Vacuum Plasma PR Strip Process Replacement
- Wafer PR After Exposure Photomask
A cleaning process - Wet Cleaning Process
Comment
- Organic film removal performance
- Improved Remaining Performance
- Activation Performance Enhancements
Package process
Target process
- Wafer direct bonding
ArP treatment process
- Replacement of vacuum plasma surface treatment process
Comment
- Improve Activation performance, reduce ROI